Summary
Catalogue: Photoacid Generator; Photo Acid Generator; PAG; Photoresist; KrF Photoresist; Photoetching; Maximum absorption wavelength; 345nm
Product Name：6-butyl-1,3-dioxo-1H-benzo[de]isoquinolin-2(3H)-yl trifluoromethanesulfonate; 6-butyl-1,3-dioxo-1H-benzo[de]isoquinolin-2(3H)-yl trifluoromethanesulfonate; Methanesulfonic acid, 1,1,1-trifluoro-, 6-butyl-1,3-dioxo-1H-benz[de]isoquinolin-2(3H)-yl ester; Methanesulfonic acid, 1,1,1-trifluoro-, 6-butyl-1,3-dioxo-1H-benz[de] isoquinolin -2(3H)-yl ester; 1.8-Naphtalimides
CAS: 1610827-31-0
Properties
Product Name： AAU16172A
CAS No.: 1610827-31-0
Chemical Name： 6-butyl-1,3-dioxo-1H-benzo[de]isoquinolin-2(3H)-yl trifluoromethanesulfonate
MF: C17H14F3NO5S
MW: 401.36
Product Detail
Appearance： Light yellow or off-white powder
Purity ≥99%
Water (Karl Fisher) ≤0.05%
Maximum absorption wavelength(nm)（1.66×104）：345nm
Largest single impurity：≤0.20%
Metal Ion：≤50ppm
Application: Electronic chemicals; Semiconductor chemistry; Photoresist; Photoacid Generator, Photo Acid Generator; PAG; photocuring; UV curabl; light curing; photo-cure
Packsize: 1g/5g/10g, Bulk for g, KG