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AAU16172A

6-butyl-n-hydroxynaphthimide trifluoromethanesulfonic acid [1610827-31-0] - Photo Acid Generator

99.0%
  • CAS Number [1610827-31-0]
  • Molecular Formula C17H14F3NO5S
  • Molecular Weight 401.36
  • Function: Photo Acid Generator
  • Application: Used in Photoresist
  • Negotiable/1G/5G/10G/25G; Bulk in KG
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    Summary

      Seebio supply high quality 6-butyl-n-hydroxynaphthimide trifluoromethanesulfonic acid(6-Bu-NIOTf, CAS#: 1610827-31-0) stably with various packsize for your convenience. For inquiry, please call400-021-8158.

      6-butyl-n-hydroxynaphthimide trifluoromethanesulfonic acid (6-Bu-NIOTf) is a cationic photo initiator, non-ionic photo acid Generator, mainly used in preparation of surface modified polymer films, positive Photoresist, Photoresist Compositions, Complex Materials, including Substrates and Coatings on the surface of substrate[1].



    Properties

      Product Name: 6-butyl-n-hydroxynaphthimide trifluoromethanesulfonic acid (6-Bu-NIOTf)

      Other Name: 6-butyl-1,3-dioxo-1H-benzo[de]isoquinolin-2(3H)-yl trifluoromethanesulfonate,

      Methanesulfonic acid, 1,1,1-trifluoro-, 6-butyl-1,3-dioxo-1H-benz[de] isoquinolin -2(3H)-yl ester

      CAS No.: 1610827-31-0

      MF: C17H14F3NO5S

      MW: 401.36

      Pack size: 1G/5G/10G/25G; Bulk in KG

      Application: Electronic chemicals; Semiconductor chemicals; Photo-resist; Photoacid Generator, Photo Acid Generator; PAG; Photo curing; UV curable; Light curing; Photo-cure; 3D/4D Printing


      CoA of Product




      Product List

      Seebio Code

      Product Name

      CAS No.

      Package Size

      AAU16172A

      6-butyl-n-hydroxynaphthimide trifluoromethanesulfonic acid (6-Bu-NIOTf)

      1610827-31-0

      1g5g10g25g



    Product Detail

      Mechanism of Photo Acid Generator of NIOTf. When exposed by a suitable light source, Sulfonate bond will be broken, and considerable amount of Sulfonic Acid can be produced[2].


      The mechanism of Photo Acid Generator used in Photo-resist for acid generator and polymer formations[2]


      Characteristics of NIOTf.

      Excellent Photo absorption ability; good solubility in organic solvent;High thermal stability; High acid yield,

      Modification and tailoring of structure through chemical synthesis is easy to achieve and control

      1, 8-Naphthalimide easily tailored and modified through various chemical synthesis, and its absorption properties will be changed correspondingly. Through the modification of Solubility, Poly-aromatics or Substitution Mode of the Naphthalene Nuclei by chemical engineering, fine-tuning of the photo properties which was desired will be easily obtained (shown in the follow picture), all these making it became a versatile candidate for promising photo Initiators [3].

      The different chemical modifications enabling to finely tune the optical properties of 1,8-naphthalimides[3].



      Reference:

      [1].J. P. Malval et al, J. Phys. Chem. A 2008, 112, 3879-3885

      [2]. K. W. et al, WO2019/ 045377 KO 2019 .03 .07

      [3]. G. Noirbent et al, European Polymer Journal 2020, 132,109702.