6-Butyl-N-hydroxynaphthalimide trifluoromethanesulfonic acid [1610827-31-0], product number AAU16172A, is a cationic photoinitiator, nonionic photoacid generator and other additives, mainly used for surface modification polymers Preparation of films, positive tone photoresist components, photoresist compositions, composite materials, including substrates and coatings applied to the surface of the substrate, etc.
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Acid Generation Mechanism: Exposure to a suitable light source causes cleavage of the sulfonate ester bond. Acid generators based on naphthalene imide sulfonate esters have higher acid production efficiency (some naphthalene-structured photoacids can be twice as powerful as other structural photoacids).
Characteristics of Naphthalimide Acid Generators
Good light absorption energy; good solubility in organic solvents; high thermal stability; high acid production rate.
The properties of the corresponding photoacids can be easily improved by chemically modifying and tailoring the structure.
The absorption properties of naphthalene imide naphthalene sulfonate photoacids can be easily fine-tuned through various chemical modifications and tailoring. Therefore, it is easy to fine-tune the optical properties of such photoacids through chemical engineering to achieve desired solubility, polyaromaticity, or substitution patterns on the naphthalene core. These tunable properties make them promising candidates for multifunctional photoinitiation.