Photo Acid Generator: 6-butyl-n-hydroxynaphthimide trifluoromethanesulfonic acid (6-Bu-NIOTf, CAS#: 1610827-31-0) Used in Photoresist
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Seebio provides high-quality 6-butyl-N-hydroxynaphthalimide trifluoromethanesulfonate (6-Bu-NIOTf, CAS#: 1610827-31-0) in a stable form with various package sizes for your convenience.
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6-butyl-N-hydroxynaphthalimide trifluoromethanesulfonate (6-Bu-NIOTf) is a cationic photoinitiator and non-ionic photoacid generator primarily used in the preparation of surface-modified polymer films, positive photoresists, photoresist compositions, and complex materials including substrates and coatings on substrate surfaces[1].
1. Product Basic Information：
Product Name: 6-butyl-n-hydroxynaphthimide trifluoromethanesulfonic acid (6-Bu-NIOTf)
Other Name: 6-butyl-1,3-dioxo-1H-benzo[de]isoquinolin-2(3H)-yl trifluoromethanesulfonate,
Methanesulfonic acid, 1,1,1-trifluoro-, 6-butyl-1,3-dioxo-1H-benz[de] isoquinolin -2(3H)-yl ester
CAS No.: 1610827-31-0
MF: C17H14F3NO5S
MW: 401.36
Pack size: 1G/5G/10G/25G; Bulk in KG
Application: Electronic chemicals; Semiconductor chemicals; Photo-resist; Photoacid Generator, Photo Acid Generator; PAG; Photo curing; UV curable; Light curing; Photo-cure; 3D/4D Printing
2. COA of Product：
3. Product List
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Seebio Code
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Product Name
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CAS No.
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Package Size
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AAU16172A
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6-butyl-n-hydroxynaphthimide trifluoromethanesulfonic acid (6-Bu-NIOTf)
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1610827-31-0
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1g、5g、10g、25g
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4. Characteristics of NIOTf used as Photoacid Generator
4.1 Mechanism of NIOTf. When exposed by a suitable light source, Sulfonate bond beaks, and considerable amount of sulfonic acid is produced[2].
The mechanism of Photo Acid Generator used in Photo-resist for acid generator and polymer formations[2]
4.2 Characteristics of NIOTf.
① Excellent Photo absorption ability; good solubility in organic solvent;High thermal stability; High acid yield,
② Modification and tailoring of the structure through chemical synthesis is easy to achieve and control
1, 8-Naphthalimide can be easily tailored and modified through various chemical synthesis, and its absorption properties change correspondingly. Through the modification of Solubility, poly-aromatics or substitution mode of the naphthalene Nuclei by chemical engineering, fine-tuning of the desired photo properties is easily obtained (shown below). These characteristics make it a versatile candidate for promising photoinitiators[3].
The different chemical modifications enabling to finely tune the optical properties of 1,8-naphthalimides[3].
Reference:
[1].J. P. Malval et al, J. Phys. Chem. A 2008, 112, 3879-3885
[2]. K. W. et al, WO2019/ 045377 KO 2019 .03 .07
[3]. G. Noirbent et al, European Polymer Journal 2020, 132,109702.
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